EUV photoresist,大家都在找解答。第1頁
由NMojarad著作·2015·被引用99次—Thesecondphotoresistwestudyishydrogensilsesquioxane(HSQ),aninorganicphotoresistwithveryhighresolutionbutlowsensitivity.Ithas ...,ThesematerialsaretheindustrystandardforEUVunderlayers,andenablefasterdevelopmentofEUVphotoresistandprocesses.Overtheyears,theseEUV ...
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Beyond EUV lithography | EUV photoresist
由 N Mojarad 著作 · 2015 · 被引用 99 次 — The second photoresist we study is hydrogen silsesquioxane (HSQ), an inorganic photoresist with very high resolution but low sensitivity. It has ... Read More
EUV | EUV photoresist
These materials are the industry standard for EUV underlayers, and enable faster development of EUV photoresist and processes. Over the years, these EUV ... Read More
Extreme ultraviolet lithography | EUV photoresist
Extreme ultraviolet lithography is an optical lithography technology using a range of extreme ultraviolet (EUV) wavelengths, ... to UV light which gets reflected onto a substrate covered by photoresist. Read More
High Sensitivity Resists for EUV Lithography | EUV photoresist
由 T Manouras 著作 · 2020 · 被引用 34 次 — Traditional 248 nm and 193 nm photoresists based on acid catalyzed hydrophilicity change of polymer pendant groups were first evaluated in EUV ... Read More
Photoresists for EUV Lithography | EUV photoresist
One of the most important components of EUVL is the technological advancement of photoresists. Although EUV photoresist performance has made dramatic ... Read More
The Physics of EUV Photoresist and How It Drives Strategies ... | EUV photoresist
EUV lithography requires high performance resists. The mechanism of light absorbance and acid generation is very different in EUV resists than in previous ... Read More
Why New Photoresist Technology Is Critical | EUV photoresist
2021年3月1日 — With its smaller wavelength, extreme ultraviolet (EUV) lithography systems can create finer chip features than its predecessor – just as ... Read More
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