Ashable hard mask,大家都在找解答。第1頁
Anashablehardmaskisgenerallycomposedofcarbon&hydrogenwithtraceamountofoneormoredopants(e.g.,nitrogen,fluorine,boron,silicon).Thebonding ...,2009年11月26日—NovellusSystemsInc.hasrolledoutasuiteofashablehardmask(AHM)films,saidtohaveupto25percentgreateretchselectivitythan ...
取得本站獨家住宿推薦 15%OFF 訂房優惠
apf film apf半導體 山帽雲 淺草中央飯店 桃園大溪石頭蝦 聖誕節餅乾推薦 iwc達文西 名洋釣具大里店 Red brick 642 B&B 仁德醫專學費查詢 豪神娛樂城新手禮包 日本空氣清淨機隨身
本站住宿推薦 20%OFF 訂房優惠,親子優惠,住宿折扣,限時回饋,平日促銷
Methods of depositing highly selective transparent ashable ... | Ashable hard mask
An ashable hard mask is generally composed of carbon & hydrogen with trace amount of one or more dopants (e.g., nitrogen, fluorine, boron, silicon). The bonding ... Read More
Novellus rolls ashable hardmask film | Ashable hard mask
2009年11月26日 — Novellus Systems Inc. has rolled out a suite of ashable hardmask (AHM) films, said to have up to 25 percent greater etch selectivity than ... Read More
Novellus Systems Introduces Ashable Hard Mask Process ... | Ashable hard mask
2007年6月25日 — Developed with a unique chemistry and enhanced plasma capability, the AHM film uniquely satisfies the demanding etch selectivity requirements of ... Read More
Novellus為193nm微影開發VECTOR AHM技術 | Ashable hard mask
2007年9月14日 — 另外,該公司也宣佈,已針對45奈米及以下製程所需的193奈米浸潤式微影技術,推出了VECTOR Ashable Hard Mask (AHM)平台。 VECTOR Extreme的平均製程週期 ... Read More
Patterning with Amorphous Carbon Thin Films | Ashable hard mask
PDF | Amorphous carbon hard mask films grown with plasma enhanced chemical vapor deposition are an enabling ... example of an ashable hard mask (AHM). Read More
Ultra high selectivity ashable hard mask film | Ashable hard mask
A method of forming an amorphous carbon layer on a substrate in a substrate processing chamber, includes introducing a hydrocarbon source into the ... Read More
When photoresist is not enough | Ashable hard mask
As Novellus SVP Tim Archer explained in a recent interview, an ashable hardmask (AHM) is typically an amorphous carbon layer, deposited by PECVD from a CxHy ... Read More
導入碳質硬式罩幕進行金屬層間接觸孔製程氧化層蝕刻之研究 | Ashable hard mask
Carbon Hard Mask for Oxide Etch in Interlayer Via Etch Process ... and S.H. Hong2, “Low Temperature Ashable Hardmask (AHM ™) Films for sub-45nm Patterning”, ... Read More
挑戰製程微縮極限半導體材料創新扮要角 | Ashable hard mask
2007年10月29日 — ... 較短,蝕刻圖形時的深寬比較高,使得薄化光阻材質已不敷使用,而須仰賴可灰化硬遮罩(Ashable Hard Mask, AHM)薄膜,來達到理想的蝕刻深寬比要求。 Read More
訂房住宿優惠推薦
17%OFF➚